Rumiko Hayase: search on Z-Library

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1

Photosensitive polyimides consisting of simple mixtures of 4-substituted diazonaphthoquinones and polyamic acids

Shuzi Hayase, Yukihiro Mikogami, Kei Takano, Yoshihiko Nakano, Rumiko Hayase

Journal:

Polymers for Advanced Technologies

Year:

1993

Language:

english

File:

PDF, 1010 KB

english, 1993

2

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

Onishi, Yasunobu, Sato, Kazuo, Chiba, Kenzi, Asano, Masafumi, Niki, Hirokazu, Hayase, Rumiko H., Hayashi, Takao, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 1.19 MB

english, 1996

3

Positive chemically amplified resists using naphthoquinone diazides as photo-acid-generators.

Hayase, Rumiko, Onishi, Yasunobu, Niki, Hirokazu, Oyasato, Naohiko, Hayase, Shuzi

Journal:

Journal of Photopolymer Science and Technology

Year:

1993

Language:

english

File:

PDF, 111 KB

english, 1993

4

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Polysiloxanes with a Phenol Moiety for Bilayer Photoresist Applications

Onishi, Yasunobu, Ushirogouchi, Touru, Horiguchi, Rumiko, Hayase, Shuzi, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 7.22 MB

english, 1989

5

Positive photosensitive polyimides using polyamic acid esters with phenol moieties

Rumiko Hayase, Naoko Kihara, Naohiko Oyasato, Shigeru Matake, Masayuki Oba

Journal:

Journal of Applied Polymer Science

Year:

1994

Language:

english

File:

PDF, 782 KB

english, 1994

6

Acid catalyzed resist for KrF excimer laser lithography. (2). Polymer dissolution inhibitors.

ONISHI, YASUNOBU, OYASATO, NAOHIKO, NIKI, HIROKAZU, HAYASE, RUMIKO HORIGUCHI, KOBAYASHI, YOSHIHITO, SATO, KAZUO, MIYAMURA, MASATAKA

Journal:

Journal of Photopolymer Science and Technology

Year:

1992

Language:

english

File:

PDF, 253 KB

english, 1992

7

Syntheses of polysilanes with functional groups. 2. Polysilanes with carboxylic acids

Hayase, Shuzi, Horiguchi, Rumiko, Onishi, Yasunobu, Ushirogouchi, Toru

Journal:

Year:

1989

Language:

english

File:

PDF, 1.76 MB

english, 1989

8

Organic photovoltaic module development with inverted device structure

Mori, Shigehiko, Oh-oka, Haruhi, Nakao, Hideyuki, Gotanda, Takeshi, Nakano, Yoshihiko, Jung, Hyangmi, Iida, Atsuko, Hayase, Rumiko, Shida, Naomi, Saito, Mitsunaga, Todori, Kenji, Asakura, Taro, Matsui

Journal:

MRS Proceedings

Year:

2015

Language:

english

File:

PDF, 5.41 MB

english, 2015

9

Plasticizer-dispersed Photopolymer for Holographic Storage at 405 nm

Sasao, Norikatsu, Hirao, Akiko, Hayase, Rumiko, Matsumoto, Kazuki, Kamikawa, Takahiro, Terai, Masaya

Journal:

Journal of Photopolymer Science and Technology

Year:

2006

File:

PDF, 1.13 MB

2006

10

Acid catalyzed resist for KrF excimer laser lithography.

ONISHI, YASUNOBU, NIKI, HIROKAZU, KOBAYASHI, YOSHIHITO, HORIGUCHI HAYASE, RUMIKO, OYASATO, NAOHIKO, SASAKI, OSAMU

Journal:

Journal of Photopolymer Science and Technology

Year:

1991

Language:

english

File:

PDF, 167 KB

english, 1991

11

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Preparations and properties of novel positive photosensitive polyimides

Hayase, Rumiko H., Kihara, Naoko, Oyasato, Naohiko, Matake, S., Oba, Masayuki, Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 649 KB

english, 1991

12

Photosensitive polyimides developable with basic aqueous solutions (II)

Kei Takano, Yukihiro Mikogami, Yoshihiro Nakano, Rumiko Hayase, Shuzi Hayase

Journal:

Journal of Applied Polymer Science

Year:

1992

Language:

english

File:

PDF, 1.36 MB

english, 1992

13

High molecular weight polysilanes with phenol moieties

Horiguchi, Rumiko, Onishi, Yasunobu, Hayase, Shuzi

Journal:

Year:

1988

Language:

english

File:

PDF, 764 KB

english, 1988

14

Chemically Amplified Resists Using 1,2-Naphthoquinone Diazide-4-sulfonates as Photoacid Generators

Journal:

Journal of The Electrochemical Society

Year:

1994

Language:

english

File:

PDF, 821 KB

english, 1994

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